n/p alternating multi-layer epiwafer

n/p alternating multi-layer epiwafer
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Items

Standard

Selected

Poly-type

4H

Surface

(0001) Si-face

Off-orientation

4deg-off [11-20]

Conductivity

n-type /p-type

Dopant

Nitrogen /  Aluminum

Carrier Concentration

Range

1E15 ~ 1E18 cm-3

1E15 1E18  cm-3

Tolerance

±25%

/

Epi thickness

Range

0.3 ~ 200 μm

0.3 ~ 200 μm

Tolerance

±10%

±10%

Surface defect

≤ 1 cm-2

≤ 1 cm-2

Surface roughness

≤ 2 nm

≤ 2 nm


Notes:

Ⅰ The carrier concentration and thickness of each layer cannot be directly measured.
Ⅱ Surface defects include downfall, triangles, carrots, particles.
Ⅲ The roughness is tested by AFM,the scan size is 10×10μm2.
Ⅳ Better products can be customized.